His research focus are mainly micro-nano structure and device fabrication, including optical lithography, electron beam lithography, nanoimprinting, focused ion beam, and PVD/CVD/ALD thin film deposition, and dry/deep silicon/wet etching; with applications in MEMS manufacturing, nanoimprint template manufacturing, nano-optical devices (AR/VR optical waveguide gratings, meta-structure/meta-surface lenses, passive silicon optical structures, etc.), silicon-based hollow biological microneedles for injection, AFM Probes, biosensors, microLEDs, terahertz receiving/emitting devices, through silicon vias for inserting optical fibers, microlenses and other fields.
General Information
More than 130 SCI papers; 4 main works other works
Works Information and Citation Data
Google Scholar:
https://scholar.google.ca/citations?hl=en&user=qxm1begAAAAJ
10 Representative Works (Cui’s student/postdoc in boldface, * refers to the corresponding author)
1. A. Pan, C. Zhu, Z. Yan, X. Zhu, Z. Liu, and B. Cui*, “Fabrication of the Highly Ordered Silicon Nanocone Array With Sub-5 nm Tip Apex by Tapered Silicon Oxide Mask”, IEEE Transactions on Semiconductor Manufacturing, 37(2), 160 (2024).
2. H. Wu, A. Pan, C. Zhu, and B. Cui*, “Fabrication of slanted gratings by using glancing angle deposition”, Journal of Vacuum Science & Technology B 42 (2), 023002 (2024).
3. D. Zhang, W. Hu, and B. Cui*, “Fabrication of hollow silicon microneedles using grayscale lithography and deep reactive ion etching”, Journal of Vacuum Science & Technology B 42 (5), 053001 (2024).
4. C. Zhu, H. Ekinci, A. Pan, B. Cui, and X. Zhu, “Electron beam lithography on nonplanar and irregular surfaces”, Microsystems & Nanoengineering 10 (1), 52 (2024).
5. R. Islam, B. Cui, G. X. Miao, “Dry etching strategy of spin-transfer-torque magnetic random access memory: A review”, J. Vac. Sci. & Technol. B, 38, 050801 (2020).
6. Y. Li, H. Zhang, R. Yang, Y. Laffitte, U. Schmill, W. Hu, M. Kaddoura, E. J. M. Blondeel, and B. Cui*, “Fabrication of sharp silicon hollow microneedles by deep reactive ion etching towards minimally-invasive diagnostics”, Microsystems & Nanoengineering, 5, 41 (2019).
7. X. Zhang, Y. Liu, M. Soltani, P. Li, B. Zhao, and B. Cui*, “Probing the interfacial charge transfer process of uniform ALD semiconductor-molecule-metal models: an SERS Study”, Journal of Physical Chemistry C, 121 (48), 26939–26948 (2017).
8. R.K. Dey, F. Aydinoglu, and B. Cui*, “Electron beam lithography on irregular surface using grafted PMMA monolayer as resist”, Advanced Materials - Interfaces, 4, 1600780 (2017).
9. J. Zhang, C. Con and B. Cui*, “Electron beam lithography on irregular surfaces with evaporated resist”, ACS Nano, 8, 3483–3489 (2014).
10. C. Con, J. Zhang and B. Cui*, “Nanofabrication of high aspect ratio structures using evaporated resist containing metal”, Nanotechnology, 25, 175301 (2014).
General Information
More than 130 SCI papers; 4 main works other works
Works Information and Citation Data
Google Scholar:
https://scholar.google.ca/citations?hl=en&user=qxm1begAAAAJ
10 Representative Works (Cui’s student/postdoc in boldface, * refers to the corresponding author)
1. A. Pan, C. Zhu, Z. Yan, X. Zhu, Z. Liu, and B. Cui*, “Fabrication of the Highly Ordered Silicon Nanocone Array With Sub-5 nm Tip Apex by Tapered Silicon Oxide Mask”, IEEE Transactions on Semiconductor Manufacturing, 37(2), 160 (2024).
2. H. Wu, A. Pan, C. Zhu, and B. Cui*, “Fabrication of slanted gratings by using glancing angle deposition”, Journal of Vacuum Science & Technology B 42 (2), 023002 (2024).
3. D. Zhang, W. Hu, and B. Cui*, “Fabrication of hollow silicon microneedles using grayscale lithography and deep reactive ion etching”, Journal of Vacuum Science & Technology B 42 (5), 053001 (2024).
4. C. Zhu, H. Ekinci, A. Pan, B. Cui, and X. Zhu, “Electron beam lithography on nonplanar and irregular surfaces”, Microsystems & Nanoengineering 10 (1), 52 (2024).
5. R. Islam, B. Cui, G. X. Miao, “Dry etching strategy of spin-transfer-torque magnetic random access memory: A review”, J. Vac. Sci. & Technol. B, 38, 050801 (2020).
6. Y. Li, H. Zhang, R. Yang, Y. Laffitte, U. Schmill, W. Hu, M. Kaddoura, E. J. M. Blondeel, and B. Cui*, “Fabrication of sharp silicon hollow microneedles by deep reactive ion etching towards minimally-invasive diagnostics”, Microsystems & Nanoengineering, 5, 41 (2019).
7. X. Zhang, Y. Liu, M. Soltani, P. Li, B. Zhao, and B. Cui*, “Probing the interfacial charge transfer process of uniform ALD semiconductor-molecule-metal models: an SERS Study”, Journal of Physical Chemistry C, 121 (48), 26939–26948 (2017).
8. R.K. Dey, F. Aydinoglu, and B. Cui*, “Electron beam lithography on irregular surface using grafted PMMA monolayer as resist”, Advanced Materials - Interfaces, 4, 1600780 (2017).
9. J. Zhang, C. Con and B. Cui*, “Electron beam lithography on irregular surfaces with evaporated resist”, ACS Nano, 8, 3483–3489 (2014).
10. C. Con, J. Zhang and B. Cui*, “Nanofabrication of high aspect ratio structures using evaporated resist containing metal”, Nanotechnology, 25, 175301 (2014).
